Product Center
Nine product categories covering a complete solution from micro-scale observation to non-destructive testing.
Zhitongfang HM Series Tool Microscope
HM Series Electric Z-Axis Measurement Microscope: Centralized operation enables one-handed blind control of the focus wheel, speed settings, and remote switch. The electric Z-axis focusing significantly enhances usability, while the built-in vibration damping mechanism ensures high repeatability accuracy. Supports dense image stitching to expand the field of view into panoramic images.
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Zhite Tongfang MM-A Series Tool Microscope
Zhite Fang MM Series Manual Z-Axis Measuring Microscope features a clutch control for quick switching between coarse and fine adjustments, with the stage moving rapidly along the X/Y axes. The manual Z-axis focusing model offers exceptional cost-effectiveness and is available in standard and high-precision configurations to meet diverse needs ranging from routine to high-accuracy measurements.
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MM Series Tool Microscope
The Nikon MM Series Measurement Microscopes are designed for industrial measurement and image analysis, delivering higher precision, digital imaging, and advanced image processing capabilities. Covering the MM-400, MM-800, and MM-200 series, they support non-contact Z-height measurements and are widely used for dimensional inspection and quality control of precision components, molds, and electronic devices.
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Nikon NEXIV VMZ-S Series
Nikon vision measuring systems deliver high-speed, high-precision geometric dimensioning. For decades, the NEXIV series has consistently met rigorous quality control and high-efficiency measurement demands with its exceptional performance. The VMZ-S series enables rapid, accurate measurement of high-precision dimensions across diverse products, including semiconductor devices, precision electronic components, and precision mechanical parts.
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Nikon iNEXIV VMA Series
The Nikon iNEXIV VMA series offers a wide field of view and long XYZ travel range, making it highly versatile for diverse measurement applications. With high accuracy and repeatability, it automatically measures various components such as injection-molded parts and electronic devices. A 73.5 mm working distance enables measurement of taller and uneven objects.
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Zeiss LSM 910
The Zeiss LSM 910 is a high-performance laser scanning confocal microscope that combines the core principles of confocal imaging with cutting-edge innovation. Its efficient optical path delivers nanometer-precision spectral flexibility, while Airyscan super-resolution imaging enables low phototoxicity, high-resolution observation. Lightfield 4D ultrafast volumetric imaging captures dynamic biological processes at speeds of up to 80 volumes per second. With LSM Plus linear Wiener deconvolution further enhancing image quality across all confocal modes, it is the ideal tool for life sciences research.
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Zeiss LSM 990
The Zeiss LSM 990 is a high-end, multi-functional laser scanning confocal microscope that breakthroughly integrates multiple imaging technologies. With super-resolution imaging down to 90 nm (Airyscan 2), high-speed volumetric imaging at 80 volumes per second (Lightfield 4D), full-spectrum detection from 380 to 900 nm (up to 36 detection channels, simultaneously resolving more than 10 fluorescent labels), multiphoton excitation for deep-tissue imaging, and molecular dynamics analysis (FCS/FLIM/FRAP/FRET), it delivers comprehensive research capabilities across all levels of life sciences—from molecules to tissues.
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ZEISS Smartzoom 5 Digital Microscope
Simplify inspection: an automated digital microscope for routine testing and failure analysis. ZEISS Smartzoom 5 is Zeiss' next-generation intelligent digital microscope, designed specifically for quality assurance applications in industry. The system features a unique professional QA/QC hardware design that integrates zooming, panoramic imaging, and coaxial illumination into a single unit. With intelligent workflows and output capabilities, it offers simple operation—enabling even untrained users to quickly master the system and achieve excellent inspection results.
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ZEISS LSM 900 Laser Scanning Confocal Microscope
The ZEISS LSM 900 is Zeiss's next-generation high-end laser scanning confocal microscope, designed for materials research and analysis. The system features a 405nm UV laser module with lateral resolution up to 120nm and a maximum scan resolution of 6144×6144 pixels. Equipped with C Epiplan-APOCHROMAT high-performance objectives and ConfoMap surface analysis software, it supports brightfield, darkfield, C-DIC, polarized light, fluorescence, and other observation modes. It is the ideal tool for surface morphology analysis in materials science, manufacturing, forensics, geology, and life sciences.
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Shixin Optical T100 Domestic 3D Profilometer
The Shixin Optical T100 is a high-end domestic 3D optical profiler developed by Shanghai Shixin Jizhi Technology Co., Ltd. It integrates three measurement principles: interferometry, confocal microscopy, and AI-based multi-focus stacking. With a compact design and plug-and-play capability, it supports large-area stitching measurements up to 125×75 mm, features a 6-position motorized nosepiece with multiple objective lenses, complies with ISO 25178 standards, and is ideal for surface texture and dimensional metrology in aerospace, automotive, electronics, and medical device applications.
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ZEISS VersaXRM 615 Scientific X-ray Microscope
The ZEISS VersaXRM 615 is a mid-range X-ray microscope from the ZEISS Versa series, featuring the ZXR-1 X-ray source (30-160 kV, 25 W) to achieve 500 nm spatial resolution. It includes the ZEN navx navigation system, Volume Scout 3D positioning, and FAST Mode for rapid scanning. Optional upgrades include the FPX flat panel extension and 40× high-resolution objectives, making it an ideal choice for materials science, semiconductors, geology, and more.
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ZEISS Xradia 515 Versa Scientific X-ray Microscope
The ZEISS Xradia 515 Versa is the entry-level X-ray microscope in the ZEISS Versa series. Equipped with a high-voltage X-ray source (30-160 kV, 10 W), it achieves 500 nm spatial resolution. Featuring Scout-and-Scan control and TXM 3D Viewer software, it supports optional FPX flat-panel extension and 40× high-resolution objectives—making it a cost-effective solution for academic research and industrial inspection.
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ZEISS VersaXRM 730 Research-Grade High-Resolution X-Ray Microscope
The ZEISS VersaXRM 730 is Zeiss's next-generation high-end X-ray microscope, featuring the proprietary 40×-Prime objective lens and ZXR-1 X-ray source. It delivers 450nm spatial resolution across a full voltage range of 30-160kV. Combining AI-powered deep learning reconstruction with end-to-end 3D navigation, it provides unparalleled sub-micron 3D imaging capabilities for semiconductor, materials science, geology, and life sciences applications.
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Sensofar S Lynx Compact Multi-Function Optical Profilometer
The S Lynx is a compact, multi-functional optical profiler from the Sensofar ecosystem. It integrates AI-driven multi-focal stacking, confocal, and interferometry technologies into a small form factor that fits in the tightest spaces. Supporting seamless stitching for large-area measurements up to 125×75 mm, it processes data directly within the probe head for plug-and-play operation. Ideal for surface texture and dimensional metrology in semiconductors, automotive, electronics, MEMS, and battery applications.
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Sensofar S neox 3D: Next-Generation High-End 3D Optical Profilometer
High-precision, ultra-fast, wide-range, fully automated — the expert in 3D surface topography measurement. The Sensofar neox is our next-generation high-end 3D optical profiler, integrating confocal microscopy, PSI/CSI interferometry, AI multi-focus stacking, and film thickness measurement into a single unit. With no moving parts, it achieves data acquisition speeds up to 180fps, vertical resolution down to 0.001nm, and complies with ISO 25178/4287 standards. Ideal for surface metrology in semiconductor manufacturing, precision machining, medical devices, and tribology applications.
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8/12-inch wafer inspection system
The AWL812 is a 12-inch wafer inspection system designed for automatic loading of 12-inch wafers (with an optional 8-inch compatibility package). It features a secure and reliable EFEM, including a LoadPort, Aligner, and Robot. The fully Chinese interface is paired with advanced optical imaging to enable macro and micro-level wafer inspection and verification. An efficient data processing system facilitates defect detection and statistical analysis. Compatible with FOUP, FOSB, and Open Cassette formats, the system supports both 200mm and 300mm wafers.
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6/8-inch wafer inspection system
The AWL series wafer inspection system combines stability and safety to reliably transport wafers, making it ideal for front-end to back-end process inspections. The AWL068 model supports 6-8-inch (150mm/200mm) wafers and accommodates Open Cassette/SMIF Pod carriers. Equipped with the SOPTOP MX68R metallographic microscope featuring an infinite chromatic correction optical system, it offers magnification of 50X-1000X and supports Brightfield, Darkfield, Polarized, and DIC observation modes.
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4/6-inch wafer inspection system
The AWL series wafer inspection system combines stability and safety to reliably transport wafers, making it ideal for front-end to back-end process inspections. The AWL046 model supports 4-6-inch (100mm/150mm) wafers and accommodates Open Cassette/SMIF Pod carriers. Equipped with the SOPTOP MX68R metallographic microscope featuring an infinite chromatic correction optical system, it offers magnification of 50X-1000X and supports Brightfield, Darkfield, Polarized, and DIC observation modes.
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MX4R / MX6R / MX8R Semiconductor Inspection Microscopes
A series of inspection microscopes designed specifically for the semiconductor industry, offering MX4R, MX6R, and MX8R models to meet wafer inspection needs for 4-inch, 6-inch, and 8-inch wafers. Equipped with an infinity-corrected achromatic optical system, it supports brightfield and darkfield reflected illumination, polarized light observation, and differential interference contrast (DIC). Motorized objective lens switching enhances efficiency, making this a cost-effective solution for semiconductor wafer inspection.
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MX12R / MX68R Semiconductor Inspection Microscope
High-performance inspection microscope engineered for the semiconductor industry. The 12-inch oversized platform accommodates large-wafer inspections, while ergonomic design enhances operator comfort. Motorized objective switching boosts efficiency, and the system supports brightfield/darkfield reflection illumination with a rotary stage—making it the ideal choice for semiconductor wafer inspection. Available in MX12R and MX68R models.
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RX50M Research-Grade Metallographic Microscope
The all-new RX50M research-grade metallurgical microscope integrates multiple first-of-its-kind innovations from Sunny Optical. With an appearance and performance aligned with global leading design trends, it aims to redefine the industrial landscape. Featuring a wide-beam imaging system, it supports 26.5mm world-class ultra-wide field of view observation and offers versatile modes including reflected brightfield, reflected darkfield, transmitted brightfield, transmitted-reflected polarized light, and reflected differential interference contrast (DIC).
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PA200/300MET Semiconductor Microscope
Bright, clear, and perfect. The optimized rack structure features a low center of gravity, high rigidity, and exceptional stability, significantly enhancing vibration resistance to ensure consistent image quality. Ideal for industrial-scale sample inspection, particularly in the semiconductor wafer and LCD display industries. Available in two models: PA200MET (8-inch stage) and PA300MET (12-inch stage), supporting brightfield, darkfield, and transmitted light configurations.
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DMS1000 Super Depth of Field Microscope
Ultra-high-resolution, ultra-depth-of-field microscope imaging system. Professional APO telecentric objectives enable rapid magnification switching from 20X to 7500X. Integrated with a 360° observation system, high-precision XYZ motorized stage, and multiple illumination modes, it delivers optimal image quality and one-click 2D-to-3D measurement analysis. Available in three models: high-resolution, monocular, and metallurgical.
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Zeiss EVO 10 Tungsten Filament Scanning Electron Microscope
Easy-to-use, intuitive, and automated imaging and analysis. The trusted quality of the ZEISS EVO Scanning Electron Microscope empowers industrial quality assurance and failure analysis labs. Designed for routine inspection and analysis applications, it is effortless to operate for both experienced microscopy technicians and engineers without prior SEM expertise.
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Zeiss Sigma 360 New Thermal Field High-Resolution Scanning Electron Microscope
Field-emission scanning electron microscope imaging system with high-quality imaging and advanced analysis capabilities. Features Zeiss Gemini's new thermal field technology for exceptional resolution at low accelerating voltages, flexible detection methods for high-resolution imaging, and an advanced EDS analysis system to enhance analytical performance.
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Zeiss GeminiSEM 360 Field Emission Scanning Electron Microscope
Your field emission SEM for information imaging and rapid insights in core facilities. The GeminiSEM 360 is the ideal instrument for academic, government, or industrial research laboratory core facilities, delivering outstanding performance across a wide range of applications and sample types. With the Gemini 1 electron optical design, enjoy industry-leading high-resolution imaging.
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NANOS Analytical Desktop Scanning Electron Microscope
NANOS combines high-resolution SEM imaging with rapid, synchronized EDS elemental analysis at an affordable price. Easy to install, use, and maintain, it delivers fast, high-quality results thanks to cutting-edge design—ideal for scientific research, product development, and industrial applications.
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